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Fabrication of all-NbN Josephson tunnel junctions using single crystal NbN films for the base electrodes

Conference · · IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:6046984
 [1]
  1. Electrotechnical Lab., 1-1-4 Umezono, Tsukuba-shi, Ibaraki 305 (JP)

This paper reports on all-NbN Josephson tunnel junctions with sputter-deposited magnesium oxide barriers fabricated using single crystal NbN films for the base electrodes. Fabricated Josephson junctions have shown good tunneling characteristics with large gap voltages (5.6--5.8 mV), narrow gap widths (0.1--0.2 mV, from 30 to 70%), and small subgap leakage currents (V{sub m} = 20--30 mV, measured at 3 mV). The result of a measurement of a subgap structure for a fabricated junction suggested that the excess leakage currents of fabricated junctions are due to multi-particle tunneling through locally thin areas in the MgO barriers.

OSTI ID:
6046984
Report Number(s):
CONF-900944--
Journal Information:
IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) Vol. 27:2; ISSN IEMGA; ISSN 0018-9464
Country of Publication:
United States
Language:
English