Fabrication of an all-refractory circuit using lift-off with image-reversal photoresist
- Westinghouse Science and Technology Center, Pittsburgh, PA (US)
This paper reports on a four-stage shift register fabricated using Nb/Al-Al{sub 2}O{sub 3}/Nb Josephson junctions, Mo resistors, Nb transmission lines, and SiO{sub 2} insulating layers. The circuit had 36 junctions (5 {mu}m, 1000 A/cm{sup 3}) and 61 resistors (1.2 ohms/square), with a minimum feature size of 2 {mu}m. An eight-mask process was used in the fabrication. All material layers were deposited by sputtering. Patterning for all but one of the masking levels was done by lift-off using image reversal lithography in most cases. Lift-off avoided many of the problems common to reactive ion etching (RIE), including the need for etch stops, non-uniformity in etching, and the formation of organic residue (polymer) on the wafer.
- OSTI ID:
- 5922113
- Report Number(s):
- CONF-900944-; CODEN: IEMGA
- Journal Information:
- IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States), Vol. 27:2; Conference: 1990 applied superconductivity conference, Snowmass, CO (United States), 24-28 Sep 1990; ISSN 0018-9464
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
INTEGRATED CIRCUITS
FABRICATION
JOSEPHSON JUNCTIONS
SUPERCONDUCTING CABLES
ELECTRICAL INSULATION
ETCHING
ION BEAMS
NIOBIUM
PHOTORESISTORS
SILICON OXIDES
SPUTTERING
BEAMS
CABLES
CHALCOGENIDES
CONDUCTOR DEVICES
ELECTRIC CABLES
ELECTRICAL EQUIPMENT
ELECTRONIC CIRCUITS
ELEMENTS
EQUIPMENT
JUNCTIONS
METALS
MICROELECTRONIC CIRCUITS
OXIDES
OXYGEN COMPOUNDS
RESISTORS
SILICON COMPOUNDS
SUPERCONDUCTING JUNCTIONS
SURFACE FINISHING
TRANSITION ELEMENTS
665412* - Superconducting Devices- (1992-)
665300 - Interactions Between Beams & Condensed Matter- (1992-)
665411 - Basic Superconductivity Studies- (1992-)