Fabrication of 12-bit A/D converter using Nb/AlO sub x /Nb Josephson junctions
Conference
·
· IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States)
OSTI ID:6046167
- Westinghouse Science and Technology Center, Pittsburgh, PA (US)
This paper reports that for reliable fabrication of Nb/AlO{sub x}/Nb Josephson integrated circuits, combinations of anodization and reactive ion etching techniques were used to make various sizes of high quality Nb/AlO{sub x}/Nb Josephson tunnel junctions and J{sub c} as high as 5000 A/cm{sup 2} and V{sub m}(2 mV) as large as 60 mV at 4.2K. A ten-level process on Nb/AlO{sub x}/Nb trilayers with J{sub c} of 1500 A/cm{sup 2} was used to fabricate a functional 12-bit A/D converter. This circuit included 2.7 {mu}m diameter junctions defined by anodization and 5 {mu}m diameter junctions defined by reactive ion etching using Nb{sub 2}O{sub 5} and Al as etch stops. A lift-off process with image-reversal photoresist was used to define SiO{sub 2} insulators, Mo resistors and Au resistors.
- OSTI ID:
- 6046167
- Report Number(s):
- CONF-900944--
- Conference Information:
- Journal Name: IEEE Transactions on Magnetics (Institute of Electrical and Electronics Engineers); (United States) Journal Volume: 27:2
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
665300 -- Interactions Between Beams & Condensed Matter-- (1992-)
665411 -- Basic Superconductivity Studies-- (1992-)
665412* -- Superconducting Devices-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ANALOG-TO-DIGITAL CONVERTERS
ANODIZATION
BEAMS
CHALCOGENIDES
CHEMICAL COATING
CORROSION PROTECTION
DEPOSITION
DESIGN
ELECTRIC CONDUCTIVITY
ELECTRICAL EQUIPMENT
ELECTRICAL PROPERTIES
ELECTROCHEMICAL COATING
ELECTROLYSIS
ELECTRONIC EQUIPMENT
EQUIPMENT
ETCHING
FABRICATION
ION BEAMS
JOSEPHSON JUNCTIONS
JUNCTIONS
LAYERS
LYSIS
NIOBIUM COMPOUNDS
NIOBIUM OXIDES
OXIDES
OXYGEN COMPOUNDS
PHOTORESISTORS
PHYSICAL PROPERTIES
REFRACTORY METAL COMPOUNDS
RESISTORS
SILICON COMPOUNDS
SILICON OXIDES
SUPERCONDUCTING JUNCTIONS
SUPERCONDUCTIVITY
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TUNNEL EFFECT
665411 -- Basic Superconductivity Studies-- (1992-)
665412* -- Superconducting Devices-- (1992-)
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ANALOG-TO-DIGITAL CONVERTERS
ANODIZATION
BEAMS
CHALCOGENIDES
CHEMICAL COATING
CORROSION PROTECTION
DEPOSITION
DESIGN
ELECTRIC CONDUCTIVITY
ELECTRICAL EQUIPMENT
ELECTRICAL PROPERTIES
ELECTROCHEMICAL COATING
ELECTROLYSIS
ELECTRONIC EQUIPMENT
EQUIPMENT
ETCHING
FABRICATION
ION BEAMS
JOSEPHSON JUNCTIONS
JUNCTIONS
LAYERS
LYSIS
NIOBIUM COMPOUNDS
NIOBIUM OXIDES
OXIDES
OXYGEN COMPOUNDS
PHOTORESISTORS
PHYSICAL PROPERTIES
REFRACTORY METAL COMPOUNDS
RESISTORS
SILICON COMPOUNDS
SILICON OXIDES
SUPERCONDUCTING JUNCTIONS
SUPERCONDUCTIVITY
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENT COMPOUNDS
TUNNEL EFFECT