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Stripe-geometry Al/sub x/Ga/sub 1-//sub x/As-GaAs quantum well lasers via hydrogenation

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98577· OSTI ID:5914942
Data are presented on stripe-geometry gain-guided Al/sub x/Ga/sub 1-//sub x/As-GaAs quantum well heterostructure lasers fabricated via masked (SiO/sub 2/) hydrogen compensation (''hydrogenation'') of the Mg and Se dopants in the multiple layer heterostructure. Continuous room-temperature laser operation is achieved with a threshold current of 24 mA and 24 mW total output at 50 mA. Near-field emission patterns show strong current confinement in the stripe-active region, and significant hydrogenation ''undercutting'' of the oxide mask.
Research Organization:
Electrical Engineering Research Laboratory, Center for Compound Semiconductor Microelectronics, and Materials Research Laboratory, University of Illinois at Urbana--Champaign, Urbana, Illinois 61801
OSTI ID:
5914942
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 51:20; ISSN APPLA
Country of Publication:
United States
Language:
English