Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Stripe-geometry quantum well heterostructure Al/sub x-italic/Ga/sub 1-//sub x-italic/As-GaAs lasers defined by defect diffusion

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.97133· OSTI ID:5501085
Impurity-free selective layer disordering, utilizing Si/sub 3/N/sub 4/ masking stripes and SiO/sub 2/ defect (vacancy) sources, is used to realize room-temperature continuous Al/sub x-italic/Ga/sub 1-//sub x-italic/As-GaAs quantum well heterostructure lasers.
Research Organization:
Electrical Engineering Research Laboratory and Materials Research Laboratory, University of Illinois at Urbana--Champaign, Urbana, Illinois 61801
OSTI ID:
5501085
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 49:9; ISSN APPLA
Country of Publication:
United States
Language:
English