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Si-implanted and disordered stripe-geometry Al/sub x/Ga/sub 1-x/As-GaAs quantum well lasers

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.95973· OSTI ID:5271937

The Si impurity is implanted into an Al/sub x/Ga/sub 1-x/ As-GaAs quantum well heterostructure to form, by impurity-induced layer disordering and donor doping, a stripe-geometry buried heterostructure laser.

Research Organization:
Electrical Engineering Research Laboratory and Materials Research Laboratory, University of Illinois at Urbana--Champaign, Urbana, Illinois 61801
OSTI ID:
5271937
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 47:9; ISSN APPLA
Country of Publication:
United States
Language:
English