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Carbon-doped Al/sub x/Ga/sub 1-//sub x/As-GaAs quantum well lasers

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.99403· OSTI ID:5733947
Data are presented demonstrating that carbon (C) can be used as the active p-type dopant in high-quality Al/sub x/Ga/sub 1-//sub x/As-GaAs quantum well laser crystals. We show, by fabricating three different types of stripe geometry laser diodes (oxide stripe, hydrogenated stripe, and impurity-induced layer-disordered stripe), that C is a stable dopant and compatible in behavior with typical integrated-circuit style of device processing. The data suggest that more complicated laser geometries are possible on C-doped material because of minimal pattern ''undercutting'' after processing by, for example, hydrogenation or impurity-induced layer disordering.
Research Organization:
Electrical Engineering Research Laboratory, Center for Compound Semiconductor Microelectronics, and Materials Research Laboratory, University of Illinois at Urbana--Champaign, Urbana, Illinois 61801
OSTI ID:
5733947
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 52:7; ISSN APPLA
Country of Publication:
United States
Language:
English