Thermal processing of photoresist materials

Patent · Tue Mar 21 04:00:00 EST 1989

OSTI ID:5913823

Ziger, D H

A method is described for making devices comprising the steps of coating a substrate with a radiation sensitive film, masking a first portion of the film and exposing an unmasked second portion to first actinic radiation, baking the film in oven for a time and at a temperature to react substantially certain constituents of the film produced by the first actinic radiation in the second portion of the radiation-sensitive film, withdrawing the substrate from the oven and exposing the radiation-sensitive film to second actinic radiation to which only the first portion of the film is sensitive, developing the radiation-sensitive film, and using the developed film as a mask for selectively processing the substrate. The patent also describes a method for making devices comprising the steps of coating a body with a radiation-sensitive coating, masking part of the coating with a mask describing the pattern, exposing part of the coating to actinic radiation directed through the mask, developing the radiation-sensitive coating so as to define thereon the pattern, and using the pattern to process selectively the body.

• Assignee: American Telephone and Telegraph Co., New York, NY
• Patent Number(s): US 4814243
• OSTI ID: 5913823
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420800* -- Engineering-- Electronic Circuits & Devices-- (-1989)
99 GENERAL AND MISCELLANEOUS
990220 -- Computers
Computerized Models
& Computer Programs-- (1987-1989)
COATINGS
COMPUTERIZED CONTROL SYSTEMS
CONTROL SYSTEMS
ELECTRICAL EQUIPMENT
ELECTROMAGNETIC RADIATION
EQUIPMENT
FABRICATION
FILMS
HEAT TREATMENTS
PHOTORESISTORS
PROTECTIVE COATINGS
RADIATIONS
RESISTORS
SUBSTRATES
TEMPERATURE MEASUREMENT
THERMAL RADIATION