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Effects of annealing temperature on microstructure and electrical and optical properties of radio-frequency-sputtered tin-doped indium oxide films

Journal Article · · Journal of the American Ceramic Society; (USA)
; ; ;  [1];  [2]
  1. Korea Advanced Inst. of Science and Technology, Cheongryang, Seoul (KR)
  2. Seoul National Univ., Shillim-dong, Seoul (KR)

Indium tin oxide (ITO) films (0.3 {mu}m thick), with a doping level of 28 mol% SnO{sub 2}, were prepared by a radio frequency magnetron sputtering method. The effects of postannealing on the microstructure and the electrical properties of the ITO films were investigated. Examination by TEM shows that the postannealing treatment induced SnO{sub 2} precipitates along the grain boundaries. The resistivity increased with increasing postannealing temperatures. The mobility of carriers appears to be responsible for the resistivity increase in these specimens.

OSTI ID:
5900735
Journal Information:
Journal of the American Ceramic Society; (USA), Journal Name: Journal of the American Ceramic Society; (USA) Vol. 72:4; ISSN 0002-7820; ISSN JACTA
Country of Publication:
United States
Language:
English