Influence of oxygen on the optical and electrical properties of magnetron-sputtered indium tin oxide thin films at ambient temperature

Robb, Alex J.; Duca, Zachary A.; White, Nasiba; Woodell, Patrick; Ward, Patrick A.

doi:10.1016/j.tsf.2023.140152

Influence of oxygen on the optical and electrical properties of magnetron-sputtered indium tin oxide thin films at ambient temperature

Journal Article · Sun Dec 03 00:00:00 EST 2023 · Thin Solid Films

DOI:https://doi.org/10.1016/j.tsf.2023.140152· OSTI ID:2404369

Robb, Alex J. ^[1]; Duca, Zachary A. ^[1]; White, Nasiba ^[1]; Woodell, Patrick ^[2]; ^[1]

Savannah River National Laboratory (SRNL), Aiken, SC (United States)
Applied Research Center (ARC), Aiken, SC (United States)

Indium Tin Oxide (ITO) thin films are commonly used as transparent conductive layers in the production of solar cells. ITO films are typically heat-treated at temperatures exceeding 200 °C after magnetron sputtering to optimize the physical, optical, and electrical characteristics for photovoltaic devices. Here, this high temperature heating procedure greatly limits the use of potential substrates, particularly those comprised of low-temperature-rated polymers. Herein, we examine the physical, optical, and electrical transport effects of oxygen:argon plasmas during radio frequency magnetron sputtering of ITO on glass and flexible polymer surfaces without subsequent heat treatment. ITO thin films were characterized via sheet resistance testing, UV-Vis spectroscopy, X-ray diffraction, and scanning electron microscopy imaging. Sheet resistance measurements revealed an increase in surface resistance with increasing oxygen concentration during sputtering. UV-Vis optical transmittance measurements demonstrated an improvement in optical transmittance with an increase in oxygen concentration reaching a maximum transmittance at an oxygen concentration of 1-2 %. Most importantly, it was discovered that producing bilayers of ITO with pure argon sputtered plasmas followed by oxygen:argon plasmas produced ITO thin films with suitable resistance and transmittance without the need for high temperature post annealing. These results highlight a methodology for the deposition of ITO thin films on temperature sensitive substrates for flexible photovoltaics and low-cost module production.

View Accepted Manuscript (DOE)

Research Organization:: Savannah River National Laboratory (SRNL), Aiken, SC (United States)

Sponsoring Organization:: USDOE; USDOE Laboratory Directed Research and Development (LDRD) Program; USDOE Office of Environmental Management (EM)

Grant/Contract Number:: 89303321CEM000080

OSTI ID:: 2404369

Alternate ID(s):: OSTI ID: 2368960

Report Number(s):: SRNL--STI-2023-00112

Journal Information:: Thin Solid Films, Journal Name: Thin Solid Films Vol. 788; ISSN 0040-6090

Publisher:: ElsevierCopyright Statement

Country of Publication:: United States

Language:: English

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36 MATERIALS SCIENCE
Flexible substrates
Indium tin oxide
Photovoltaics
Radio-frequency magnetron sputtering
Solar cells

Influence of oxygen on the optical and electrical properties of magnetron-sputtered indium tin oxide thin films at ambient temperature

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