Optimization of the electrical and optical properties of ITO layers deposited by magnetron sputtering

Book · Fri Dec 31 04:00:00 EST 1993

OSTI ID:201301

Cochrane, G; Zheng, Z T ^[1]; Smith, G B ^[2]

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1. Australian Defence Force Academy, Canberra (Australia)
2. Univ. of Technology, Sydney, New South Wales (Australia)

A comprehensive investigation of the deposition parameters of In{sub 2}O{sub 3}:Sn films on Corning 7059 glass substrates using r.f. planar magnetron sputtering has lead to the production of films with a sheet resistance <1.5 ohms per square, an integrated luminous transmittance of {approximately}77% and an integrated solar transmittance of {approximately}54%. Films characterized by measurement of their resistivity and Hall coefficient show a distinct minimum in film resistivity with deposition rate, substrate temperature, oxygen partial pressure, total deposition pressure and target composition. Results are presented showing the variation in carrier concentration and carrier mobility as a function of the deposition parameters together with the optical properties and microstructure of films with a resistivity approaching 10{sup {minus}4} {Omega}cm. Potentially, films with these properties can be used for energy efficient window applications. The results indicate that it should be possible to industrially produce large area ITO for electrochromic windows with sufficiently low sheet resistance coupled with high visible transmittance.

• OSTI ID: 201301
• Report Number(s): CONF-930722--; ISBN 0-8194-1266-X
• Country of Publication: United States
• Language: English

Related Subjects

32 ENERGY CONSERVATION, CONSUMPTION, AND UTILIZATION
36 MATERIALS SCIENCE
ELECTRICAL PROPERTIES
ELECTROCHROMISM
EXPERIMENTAL DATA
INDIUM OXIDES
OPTICAL PROPERTIES
SEMICONDUCTOR MATERIALS
TIN OXIDES
WINDOWS