Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Comparison of low-energy x-ray and cobalt-60 irradiations of MOS devices as a function of gate bias

Conference ·
OSTI ID:5878869
; ;  [1];  [2]
  1. Sandia National Labs., Albuquerque, NM (USA)
  2. L and M Technologies, Inc., Albuquerque, NM (USA)

The E{sup {minus}{1/2}} electric field dependence of the saturated density of interface traps in MOS devices is used to improve estimates of charge yield during {sup 60}Co irradiations. Previous discrepancies between 10-keV x-ray and {sup 60}Co response are resolved. 14 refs., 7 figs.

Research Organization:
Sandia National Labs., Albuquerque, NM (USA)
Sponsoring Organization:
DOD; Department of Defense, Washington, DC (USA)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5878869
Report Number(s):
SAND-91-0448C; CONF-910751--4; ON: DE91008174
Country of Publication:
United States
Language:
English