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High pressure measurements on photopumped low threshold Al/sub x/Ga/sub 1-x/As quantum well lasers

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.332677· OSTI ID:5853777

Data are presented on the continuous (cw) 300 K photopumped laser operation of a low threshold Al/sub x/'Ga/sub 1-x/'As--GaAs (x'approx.0.30) single quantum well heterostructure (quantum well size L/sub z/approx.60 A) subjected to high pressure (0--11 kbar) in a simple opposed anvil apparatus. Beyond approx.11 kbar where the central Al/sub x/'Ga/sub 1-x/'As waveguide region undergoes a direct--indirect transition, and the waveguide confinement begins to weaken and deep levels tend to become important, the laser threshold increases rapidly and ''quenches'' cw 300 K operation. Pulsed 300 K photopumped laser operation of an undoped 121-period Al/sub x/Ga/sub 1-x/As--GaAs (xapprox.0.5) superlattice in the pressure range from 0--11 kbar is shown for reference. The pressure coefficients of the quantum well heterostructure and the superlattice lasers are comparable (approx.11 meV/kbar).

Research Organization:
Electrical Engineering Research Laboratory and Materials Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801
DOE Contract Number:
AC02-76ER01198
OSTI ID:
5853777
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 54:8; ISSN JAPIA
Country of Publication:
United States
Language:
English