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Investigation of the photoelectric characteristics of high-resistivity silicon photoconverters

Journal Article · · Appl. Solar Energy (USSR) (Engl. Transl.); (United States)
OSTI ID:5848711
The results of a theoretical and experimental analysis of the dependence of the fundamental operation parameters of photoconverters made of high-resistance silicon (the photo-emf, the short-circuit current, and the spectral distribution of the photosensitivity) on the thickness of the doped layer and the i-layer, the charge-carrier diffusion length, and the direction of illumination are presented. The conditions under which high conversion efficiency of the light can be achieved are determined. The part played by the Dember volume emf is determined, and the conclusion that it is preferable to illuminate a high-resistance silicon photo-converter from the side of the p-layer is verified. The photo emf of the photo-converters investigated reaches 580 mV, and can obviously be increased by reducing the thickness of the i-layer.
OSTI ID:
5848711
Journal Information:
Appl. Solar Energy (USSR) (Engl. Transl.); (United States), Journal Name: Appl. Solar Energy (USSR) (Engl. Transl.); (United States) Vol. 14:6; ISSN ASOEA
Country of Publication:
United States
Language:
English