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High-efficiency, low-threshold, Zn-diffused narrow stripe GaAs/GaAlAs double heterostructure lasers grown by metalorganic chemical vapor deposition

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.93042· OSTI ID:5825655
Deep Zn-diffused, 4-..mu..m stripe thin p active layer GaAs/GaAlAs double heterostructure lasers grown by metalorganic chemical vapor deposition are reported. Threshold currents as low as 40 mA (length 220 ..mu..m), a characteristic temperature as large as 170 /sup 0/C, and external differential quantum efficiencies as high as 80--90% are obtained. Single longitudinal and transverse mode operation of these lasers is also observed.
Research Organization:
Rockwell International, Microelectronics Research and Development Center, P. O. Box 1085, Thousand Oaks, California 91360
OSTI ID:
5825655
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:3; ISSN APPLA
Country of Publication:
United States
Language:
English