Preparation and characterization of hydrogenated amorphous silicon thin films and thin film solar cells produced by ion plating techniques. Second quarterly progress report, 1 April-30 June 1979
Using quartz substrates, hydrogenated a-Si thin films have now been produced both by glow discharge decomposition of silane and by the controlled ion plating of high purity through glow discharges composed of silane, hydrogen, and argon using a modified Takagi apparatus. Thus far, thin films produced by both glow discharge decomposition of silane with and without magnetic confinement and by ion plating have been characterized and compared using x-ray deffractometry, infrared spectroscopy, optical absorption spectroscopy and by their temperature dependence of resistivity. Based on these results, the ion plating technique of producing a-Si thin films looks extremely encouraging. Films have been produced at approximately ten times the deposition rate obtained using glow discharge decomposition of silane, even with magnetic field containment. In addition the resulting thin film properties measured to date compared favorably with those obtained from our glow discharge produced films and the properties of glow discharge produced films reported in the literature.
- Research Organization:
- Duke Univ., Durham, NC (USA). Dept. of Mechanical Engineering and Materials Science
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC03-79ET23041
- OSTI ID:
- 5758073
- Report Number(s):
- DOE/ET/23035-2
- Country of Publication:
- United States
- Language:
- English
Similar Records
Preparation and characterization of hydrogenated amorphous silicon thin films and thin film solar cells produced by ion plating techniques. Second quarterly progress report, 1 April 1979-30 Jun 1979
Hydrogenated amorphous-silicon thin films produced by ion plating
Preparation and characterization of hydrogenated amorphous silicon thin films and thin film solar cells produced by ion plating techniques. Third quarterly progress report, July 1-September 30, 1979
Technical Report
·
Sat Sep 01 00:00:00 EDT 1979
·
OSTI ID:5949198
Hydrogenated amorphous-silicon thin films produced by ion plating
Journal Article
·
Sun Jun 01 00:00:00 EDT 1980
· Appl. Phys. Lett.; (United States)
·
OSTI ID:5417597
Preparation and characterization of hydrogenated amorphous silicon thin films and thin film solar cells produced by ion plating techniques. Third quarterly progress report, July 1-September 30, 1979
Technical Report
·
Wed Oct 31 23:00:00 EST 1979
·
OSTI ID:5718964
Related Subjects
14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360603 -- Materials-- Properties
ABSORPTION SPECTROSCOPY
ABSORPTIVITY
AMORPHOUS STATE
CHEMICAL REACTIONS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
DIRECT ENERGY CONVERTERS
ELECTRIC CONDUCTIVITY
ELECTRIC DISCHARGES
ELECTRICAL PROPERTIES
ELEMENTS
ENERGY GAP
EQUIPMENT
FABRICATION
FILMS
HYDRIDES
HYDROGEN COMPOUNDS
HYDROGENATION
INFRARED SPECTROMETERS
MEASURING INSTRUMENTS
OPTICAL PROPERTIES
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PHYSICAL PROPERTIES
PLATING
PRODUCTION
SCATTERING
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SPECTROMETERS
SPECTROSCOPY
SURFACE COATING
X-RAY DIFFRACTION
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
36 MATERIALS SCIENCE
360601 -- Other Materials-- Preparation & Manufacture
360603 -- Materials-- Properties
ABSORPTION SPECTROSCOPY
ABSORPTIVITY
AMORPHOUS STATE
CHEMICAL REACTIONS
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
DIRECT ENERGY CONVERTERS
ELECTRIC CONDUCTIVITY
ELECTRIC DISCHARGES
ELECTRICAL PROPERTIES
ELEMENTS
ENERGY GAP
EQUIPMENT
FABRICATION
FILMS
HYDRIDES
HYDROGEN COMPOUNDS
HYDROGENATION
INFRARED SPECTROMETERS
MEASURING INSTRUMENTS
OPTICAL PROPERTIES
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PHYSICAL PROPERTIES
PLATING
PRODUCTION
SCATTERING
SEMIMETALS
SILANES
SILICON
SILICON COMPOUNDS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SPECTROMETERS
SPECTROSCOPY
SURFACE COATING
X-RAY DIFFRACTION