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U.S. Department of Energy
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Photoelectronic properties of zinc phosphide crystals, films and heterojunctions. Quarterly progress report No. 3, October 1-December 31, 1979

Technical Report ·
DOI:https://doi.org/10.2172/5718749· OSTI ID:5718749
An increase in crystal growth rate for Zn/sub 3/P/sub 2/ was achieved by a vacuum baking step before crystal growth designed to reduce the pressure of excess gases in the ampoule. An analysis of the problem indicates that results are consistent with expectations. Samples have been submitted to SERI for mass spectroscopic evaluation and SIMS analysis. Construction of suitable equilibrium defect distribution diagrams for Zn/sub 3/P/sub 2/ was initiated. Typical diagrams with their interpretation will be included in the next report. Good rectifying diodes were prepared by vacuum evaporation of Mg onto etched surfaces of Zn/sub 3/P/sub 2/. A barrier height of 0.75 eV was measured from C-V data in good agreement with the published value of 0.80 eV. If the Zn/sub 3/P/sub 2/ surface was given a heat treatment in oxygen before Mg evaporation, the Mg made an ohmic contact indistinguishable from the normal ohmic Ag contact to Zn/sub 3/P/sub 2/. If the Zn/sub 3/P/sub 2/ surface was given a heat treatment in hydrogen before Mg evaporation, good diode characteristics were observed, with strong forward current saturation above 1V. The resistivity of Zn/sub 3/P/sub 2/ films deposited by CSVT in Ar is 1500 ohm-cm before laser annealing and 1200 ohm-cm after laser annealing. Laser annealing apparently produces a preferred orientation of these films. Microprobe analyses of the films deposited by CSVT and vacuum evaporation indicate that these films are almost always Zn-rich with an average 69 atomic % Zn and 31 atomic % P. Films deposited by vacuum evaporation, on the other hand, are strongly P-rich. Variations in stoichiometry with position on a single film are also observed.
Research Organization:
Stanford Univ., CA (USA). Dept. of Materials Science and Engineering
DOE Contract Number:
EG-77-C-01-4042
OSTI ID:
5718749
Report Number(s):
DSE-4042-T18
Country of Publication:
United States
Language:
English