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In/GaAs reaction: influence of an intervening oxide layer

Technical Report ·
OSTI ID:5700383
The interface morphologies of the In/GaAs heterojunction with and without a thin (1 approx.2 nm) intervening native oxide layer have been studied before and after annealing at 350/sup 0/C by scanning electron microscopy, transmission electron microscopy and diffraction, energy dispersive spectrometry of x-rays and cross-sectional high resolution transmission electron microscopy. Results were combined to provide a detailed description of the structural evolution of the In/GaAs heterojunction and the effect of the intervening oxide on the In/GaAs reaction. The SEM and TEM images revealed the surface morphologies of the as-deposited indium on the GaAs substrate with and without the intervening oxide. Epitaxial indium islands were formed on the oxide-free substrate with the orientation relationship (011)/sub GaAs/ parallel to (111)/sub In/, (200)/sub GaAs/ parallel to (110)/sub In/. This morphology was explained by considering the surface energy of indium and the reduction in interfacial energy due to epitaxy. Instead of a graded heterojunction, an abrupt interface was found between the epitaxial phase In/sub 1-x/Ga/sub x/As formed after annealing and the GaAs substrate. The results also showed that the native oxide on the substrate disrupts the orientation relationship at the In/GaAs interface, and greatly inhibits the In/GaAs reaction at 350/sup 0/C.
Research Organization:
Lawrence Berkeley Lab., CA (USA)
DOE Contract Number:
AC03-76SF00098
OSTI ID:
5700383
Report Number(s):
LBL-21371; ON: DE86012017
Country of Publication:
United States
Language:
English