Optimization of parameters affecting LSM performance as diffractors of x rays: Final technical report, 13 May 1986-31 October 1987
Technical Report
·
OSTI ID:5647625
Our efforts during this contract period were directed toward a deeper understanding of several important issues related to multilayer x-ray mirrors. The results have important practical applications. The topics studied included: Basic Stress-Strain-Curvature Theory for Thin Silicon Wafers with Oxide and Nitride Films; this theory and accompanying experimental verification could form the basis for development of a code that will be able to predict the final figure of a silicon substrate that has been etched and treated with oxide or nitride films; this code will allow the design and fabrication of sophisticated curved multilayers; we have applied our theoretical understanding of multilayers to the design of multilayer x-ray optics; Multilayer X-ray Data Analysis Codes; these codes allow the massaging and display of x-ray multilayer characterization data in a wide variety of graphical ways; the code is user friendly; simulation of multilayers behavior in a high x-ray flux environment; this code combines an x-ray input code (BUCKL) with a 1-D hydrodynamic code (Chart-D) and our own iterative multilayer design code to determine the reflectivity of multilayers as a function of time when the multilayer is in a region of high x-ray flux; BUCKL and Chart-D are from Sandia Labs.; and we have completed the first series of experimental measurements of multilayer reflectivity while subjected to a pulse of intense x-ray flux; the experiments were done with the Phoenix laser at LLNL; the results are included. 48 refs., 29 figs.
- Research Organization:
- Brigham Young Univ., Provo, UT (USA)
- DOE Contract Number:
- AS08-86DP10579; W-7405-ENG-48
- OSTI ID:
- 5647625
- Report Number(s):
- DOE/DP/10579-1; ON: DE88005809
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
42 ENGINEERING
420200* -- Engineering-- Facilities
Equipment
& Techniques
COHERENT SCATTERING
COMPUTER GRAPHICS
COMPUTERIZED SIMULATION
DATA ANALYSIS
DESIGN
DIFFRACTION
DOCUMENT TYPES
FABRICATION
MIRRORS
OPTICS
OPTIMIZATION
PERFORMANCE
PROGRESS REPORT
RESEARCH PROGRAMS
SCATTERING
SILICON COMPOUNDS
SIMULATION
STRESS ANALYSIS
SUBSTRATES
THREE-DIMENSIONAL CALCULATIONS
X-RAY DIFFRACTION
420200* -- Engineering-- Facilities
Equipment
& Techniques
COHERENT SCATTERING
COMPUTER GRAPHICS
COMPUTERIZED SIMULATION
DATA ANALYSIS
DESIGN
DIFFRACTION
DOCUMENT TYPES
FABRICATION
MIRRORS
OPTICS
OPTIMIZATION
PERFORMANCE
PROGRESS REPORT
RESEARCH PROGRAMS
SCATTERING
SILICON COMPOUNDS
SIMULATION
STRESS ANALYSIS
SUBSTRATES
THREE-DIMENSIONAL CALCULATIONS
X-RAY DIFFRACTION