Closed system fabrication of Josephson tunnel junctions

Journal Article · Mon Mar 01 04:00:00 EST 1982 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.93098· OSTI ID:5637096

Hohenwarter, G K; Nordman, J E

A technique for the fabrication of Josephson tunnel junctions without breaking vacuum and without the use of masks is presented. No chemical processing is done on either of the junction electrode surfaces. Hence, no chemical or reactive cleaning is required before the formation of the tunneling barrier. Nevertheless, standard photolithography and chemical or plasma etching can be employed for defining patterns. I-V characteristics of Nb-NbOx-Pb junctions fabricated by this method have not exhibited a ''knee'' at the onset of the quasiparticle current.

• Research Organization: Department of Electrical and Computer Engineering, University of Wisconsin, Madison, Wisconsin 53706
• OSTI ID: 5637096
• Journal Information: Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 40:5; ISSN APPLA
• Country of Publication: United States
• Language: English

Related Subjects

420201* -- Engineering-- Cryogenic Equipment & Devices
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
CHALCOGENIDES
CHEMICAL REACTIONS
CLEANING
ELECTRODES
ELEMENTS
ETCHING
FABRICATION
JOSEPHSON JUNCTIONS
JUNCTIONS
LEAD
METALS
NIOBIUM
NIOBIUM COMPOUNDS
NIOBIUM OXIDES
OXIDES
OXYGEN COMPOUNDS
PLASMA
POTENTIALS
REFRACTORY METALS
SUPERCONDUCTING JUNCTIONS
SURFACE CLEANING
SURFACE FINISHING
SURFACES
TRANSITION ELEMENT COMPOUNDS
TRANSITION ELEMENTS
TUNNEL EFFECT