Laser-driven fusion etching process
This patent describes a process for etching a solid ionic substrate comprising: (a) applying a layer of coating material to a surface of the substrate, the coating material capable of reacting with the substrate when the substrate is in molten form, (b) selectively irradiating regions of the substrate surface to melt at least a portion of the substrate and form a fusion reaction product at the irradiated regions, and (c) removing the fusion reaction product and any excess coating material from the surface of the substrate by dissolving the fusion reaction product and the excess coating material with a solvent which does not substantially dissolve the substrate to thereby form an etched pattern in the substrate surface.
- Assignee:
- Dept. of Energy, Washington, DC
- Patent Number(s):
- US 4838989
- OSTI ID:
- 5613854
- Resource Relation:
- Patent File Date: 25 Aug 1987
- Country of Publication:
- United States
- Language:
- English
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Laser-driven fusion etching process
Etching of LiNbO/sub 3/ by laser-driven fusion of salts