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Title: Investigation of radiation defects in silicon bombarded with 20 MeV protons

Journal Article · · Sov. Phys. - Semicond. (Engl. Transl.); (United States)
OSTI ID:5612682

A study was made of the influence of irradiation with 20 MeV protons on the properties of n-type silicon with an initial resistivity from 0.3 to 20 ..cap omega.. x cm. The parameters of the newly formed radiation defects were determined by the thermally stimulated capacitance and photocapacitance methods using previously prepared p/sup +/-n diode structures. The temperature dependence of the rate of thermal ionization of electrons and the photocapacitance spectrum indicated that irradiation of n-type silicon with a proton dose of approx.10/sup 14/ cm/sup -2/ produced mainly four levels with ionization energies E/sub c/-0.17, E/sub c/-0.31, E/sub c/-0.46, and E/sub v/+0.32 eV. The experimental results (ionization energies of the levels, thermal ionization cross sections of the majority carriers, rates of introduction of radiation defects, etc.) indicated that the E/sub c/-0.46 eV level was associated with the E centers, E/sub c/-0.31 eV was due to divacancy-phosphorus complexes, and E/sub c/-0.17 eV was due to complexes larger than the A centers.

Research Organization:
Institute of Nuclear Physics, Academy of Sciences of the Uzbek SSR, Tashkent
OSTI ID:
5612682
Journal Information:
Sov. Phys. - Semicond. (Engl. Transl.); (United States), Vol. 15:12
Country of Publication:
United States
Language:
English