Potential applications of an electron cyclotron resonance multicusp plasma source

Conference · Sun Jan 01 00:00:00 EST 1989

OSTI ID:5590978

Tsai, C C; Berry, L A; Gorbatkin, S M; Haselton, H H; Roberto, J B; Stirling, W L

An electron cyclotron resonance (ECR) multicusp plasmatron has been developed by feeding a multicusp bucket arc chamber with a compact ECR plasma source. This novel source produced large (about 25-cm-diam), uniform (to within {plus minus}10%), dense (>10{sup 11}-cm{sup -3}) plasmas of argon, helium, hydrogen, and oxygen. It has been operated to produce an oxygen plasma for etching 12.7-cm (5-in.) positive photoresist-coated silicon wafers with uniformity within {plus minus}8%. Results and potential applications of this new ECR plasma source for plasma processing of thin films are discussed. 21 refs., 10 figs.

• Research Organization: Oak Ridge National Lab., TN (USA)
• Sponsoring Organization: DOE/ER
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 5590978
• Report Number(s): CONF-891093-3; ON: DE90001358; TRN: 89-026128
• Resource Relation: Conference: 36. American Vacuum Society national vacuum symposium, Boston, MA (USA), 23-27 Oct 1989
• Country of Publication: United States
• Language: English

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