Potential applications of an electron cyclotron resonance multicusp plasma source
Journal Article
·
· Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
- Oak Ridge National Laboratory, Oak Ridge, TN (USA)
An electron cyclotron resonance (ECR) multicusp plasmatron has been developed by feeding a multicusp bucket arc chamber with a compact ECR plasma source. This novel source produces large (about 25 cm diam), uniform (to within {plus minus}10%), dense ({gt}10{sup 11} cm{sup {minus}3}) plasmas of argon, helium, hydrogen, and oxygen. It has been operated to produce an oxygen plasma for etching 12.7 cm (5 in.) positive photoresist-coated silicon wafers with uniformity within {plus minus}8%. Results and potential applications of this new ECR plasma source for plasma processing of thin films are discussed.
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 7040349
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA) Vol. 8:3; ISSN 0734-2101; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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