Potential applications of an electron cyclotron resonance multicusp plasma source

Technical Report · Thu Mar 01 00:00:00 EST 1990

DOI:https://doi.org/10.2172/7097370· OSTI ID:7097370

Tsai, C. C.; Berry, L. A.; Gorbatkin, S. M.; Haselton, H. H.; Roberto, J. B.; Schechter, D. E.; Stirling, W. L.

An electric cyclotron resonance (ECR) multicusp plasmatron has been developed by feeding a multicusp bucket arc chamber with a compact ECR plasma source. This novel source produces large (about 25-cm- diam), uniform (to within {plus minus}10%), dense (>10{sup 11}--cm{sup {minus}3}) plasmas of argon, helium, hydrogen, and oxygen. It has been operated to produce an oxygen plasma for etching 12.7-cm (5-in.) positive photoresist-coated silicon wafers with uniformity within {plus minus}8%. Following a brief review of the large plasma source developed at Oak Ridge National Laboratory, the configuration and operation of the source are described and a discharge model is presented. Results from this new ECR plasma source and potential applications for plasma processing of thin films are discussed. 21 refs., 10 figs.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
• Sponsoring Organization: DOE/ER
• DOE Contract Number: AC05-84OR21400
• OSTI ID: 7097370
• Report Number(s): ORNL/TM-11442; ON: DE90012027; TRN: 90-020123
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
PLASMATRONS
THIN FILMS
ETCHING
ELECTRON CYCLOTRON-RESONANCE
ION SOURCES
OPERATION
USES
CYCLOTRON RESONANCE
ELECTRON TUBES
FILMS
RESONANCE
SURFACE FINISHING
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions
656003 - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)