Potential applications of an electron cyclotron resonance multicusp plasma source
An electric cyclotron resonance (ECR) multicusp plasmatron has been developed by feeding a multicusp bucket arc chamber with a compact ECR plasma source. This novel source produces large (about 25-cm- diam), uniform (to within {plus minus}10%), dense (>10{sup 11}--cm{sup {minus}3}) plasmas of argon, helium, hydrogen, and oxygen. It has been operated to produce an oxygen plasma for etching 12.7-cm (5-in.) positive photoresist-coated silicon wafers with uniformity within {plus minus}8%. Following a brief review of the large plasma source developed at Oak Ridge National Laboratory, the configuration and operation of the source are described and a discharge model is presented. Results from this new ECR plasma source and potential applications for plasma processing of thin films are discussed. 21 refs., 10 figs.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- Sponsoring Organization:
- DOE/ER
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 7097370
- Report Number(s):
- ORNL/TM-11442; ON: DE90012027
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
Molecular & Chemical Physics-- Beams & their Reactions
656003 -- Condensed Matter Physics-- Interactions between Beams & Condensed Matter-- (1987-)
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
CYCLOTRON RESONANCE
ELECTRON CYCLOTRON-RESONANCE
ELECTRON TUBES
ETCHING
FILMS
ION SOURCES
OPERATION
PLASMATRONS
RESONANCE
SURFACE FINISHING
THIN FILMS
USES