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U.S. Department of Energy
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Phase 2 of the automated array assembly task of the Low-Cost Silicon Solar Array Project. Technical quarterly report No. 5, July 1-September 30, 1979

Technical Report ·
DOI:https://doi.org/10.2172/5579283· OSTI ID:5579283
Ion implantation, metallization, and plasma pattern etching of silicon nitride tasks are highlighted. Experiments were performed to evaluate solar cells formed by simulated unanalyzed beam ion implantation, comparing these cells with analyzed beam implanted cells. Plasma patterning of silicon nitride with mechanical masks has been improved, primarily through equipment modifications. Finally, nickel and copper plating have been performed on solar cells, demonstrating feasibility of this base-metal system. The contract has been modified to delay the plasma silicon and texturing etching efforts to the next quarter.
Research Organization:
Motorola, Inc., Phoenix, AZ (USA). Semiconductor Group
DOE Contract Number:
NAS-7-100-954847
OSTI ID:
5579283
Report Number(s):
DOE/JPL/954847-79/6
Country of Publication:
United States
Language:
English