Phase 2 of the automated array assembly task of the Low-Cost Silicon Solar Array Project. Technical quarterly report No. 6, 1 October 1979-31 December 1979

Technical Report · Mon Jan 01 04:00:00 EST 1979

DOI:https://doi.org/10.2172/5277125· OSTI ID:5277125

Coleman, M G; Pryor, R A; Sparks, T G; Saltzman, D L

The ion implantation, metallization, and plasma etching processes are highlighted. Replacement of the hydrocarbon vacuum pump oils in the ion implanter with perfluorinated polyether pump oils has decreased, but not eliminated the formation of a carbonaceous surface layer on implanted wafers. Simulated unanalyzed beam ion implantation of boron for p-on-n cell fabrication has shown preliminary favorable results, showing better performance than control analyzed beam boron implants. An ion milling machine was adapted for true unanalyzed beam implants. The results show that high quality solar cells can be made with a high current unanalyzed ion beam. A new plasma etching unit has been obtained for patterning experiments. Preliminary experiments have been run. A polymerization effect of reactant gases has been observed, presenting a control problem. Changes in mask materials and gas compositions have been shown to eliminate this problem with the plasma patterning process. A re-evaluation of electroless nickel plating bath compositions has led to a new bath which gives successful plating without the formation of an oxide layer on the silicon surface observed with the previous baths. Low stress copper layers have been electroplated without the formation of an oxide layer on the silicon surface observed with the previous baths. Low stress copper layers have been electroplated over electroless nickel. The layers show suitable properties for solar cells. Cells have now been fabricated and heat treated with nickel-copper metallization. Nickel is shown to be a suitable barrier to copper diffusion into silicon.

• Research Organization: Motorola, Inc., Phoenix, AZ (USA). Semiconductor Group
• DOE Contract Number: NAS-7-100-954847
• OSTI ID: 5277125
• Report Number(s): DOE/JPL/954847-80/7
• Country of Publication: United States
• Language: English

Related Subjects

14 SOLAR ENERGY
140501* -- Solar Energy Conversion-- Photovoltaic Conversion
ATOMIC IONS
BEAMS
BORON IONS
CHARGED PARTICLES
COPPER
DEPOSITION
DIRECT ENERGY CONVERTERS
ELECTRIC CONTACTS
ELECTRICAL EQUIPMENT
ELECTRODEPOSITION
ELECTROLYSIS
ELECTROPLATING
ELEMENTS
EQUIPMENT
ETCHING
FABRICATION
ION BEAMS
ION IMPLANTATION
IONS
LYSIS
METALS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
PLATING
PROCESSING
RESEARCH PROGRAMS
SILICON SOLAR CELLS
SOLAR CELLS
SOLAR EQUIPMENT
SURFACE COATING
SURFACE FINISHING
TRANSITION ELEMENTS