Reduction imaging with soft x rays for projection lithography

Journal Article · Tue Dec 31 23:00:00 EST 1991 · Review of Scientific Instruments; (United States)

DOI:https://doi.org/10.1063/1.1142648· OSTI ID:5568968

MacDowell, A A ^[1]; Bjorkholm, J E; Bokor, J; Eichner, L; Freeman, R R; Pastalan, J Z; Szeto, L H; Tennant, D M; Wood, II, O R ^[2]; Jewell, T E; Mansfield, W M; Waskiewicz, W K; White, D L; Windt, D L ^[3]

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1. AT T Bell Laboratories, 510 E Brookhaven Laboratory, Upton, New York 11973 (United States)
2. AT T Bell Laboratories, Crawfords Corner Road, Holmdel, New Jersey 07733 (United States)
3. AT T Bell Laboratories, 600 Mountain Avenue, Murray Hill, New Jersey 07974 (United States)

It has been shown that it is possible to produce near diffraction limited images with soft x rays of wavelength 13.8 nm using normal incidence Si/Mo-multilayered coated optics. Initial experiments with a 20X reduction Schwarzschild optic produced features as small as 50 nm. It is considered that soft x-ray projection lithography may be a likely candidate for the future generation of lithographic tools needed to produce 0.1-{mu}m features for integrated circuits around the turn of the century.

• OSTI ID: 5568968
• Journal Information: Review of Scientific Instruments; (United States), Journal Name: Review of Scientific Instruments; (United States) Vol. 63:1; ISSN RSINA; ISSN 0034-6748
• Country of Publication: United States
• Language: English

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ELECTROMAGNETIC RADIATION
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