Toward the development of a soft x-ray reflection imaging microscope in the Schwarzschild configuration using a soft x-ray laser at 18. 2 nm

Technical Report · Sat Nov 30 23:00:00 EST 1991

DOI:https://doi.org/10.2172/6166356· OSTI ID:6166356

Dicicco, D; Rosser, R ^[1]; Kim, D; Suckewer, S ^[2]

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1. Princeton X-Ray Laser, Inc., Monmouth Junction, NJ (United States)
2. Princeton Univ., NJ (United States). Plasma Physics Lab.

We present the recent results obtained from a soft X-ray reflection imaging microscope in the Schwarzschild configuration. The microscope demonstrated a spatial resolution of 0.7 {mu}m with a magnification of 16 at 18.2 nm. The soft X-ray laser at 18.2 nm was used as an X-ray source. Mo/Si multilayers were coated on the Schwarzschild optics and the normal incidence reflectivity at 18.2 nm per surface was measured to be {approximately} 20 %. 18 refs., 6 figs.

• Research Organization: Princeton Univ., NJ (United States). Plasma Physics Lab.
• Sponsoring Organization: DOE; USDOE, Washington, DC (United States)
• DOE Contract Number: AC02-76CH03073; FG05-90ER80967
• OSTI ID: 6166356
• Report Number(s): PPPL-2780; ON: DE92003995
• Country of Publication: United States
• Language: English

Related Subjects

440600* -- Optical Instrumentation-- (1990-)
47 OTHER INSTRUMENTATION
COATINGS
DESIGN
ELECTROMAGNETIC RADIATION
EQUIPMENT
IONIZING RADIATIONS
LASERS
OPTICAL PROPERTIES
OPTICAL SYSTEMS
PHYSICAL PROPERTIES
RADIATIONS
REFLECTIVE COATINGS
REFLECTIVITY
SURFACE PROPERTIES
X RADIATION
X-RAY EQUIPMENT
X-RAY LASERS