Multilayer mirror technology for soft-x-ray projection lithography
- Lawrence Livermore National Laboratory, P.O. Box 808, Livermore, California 94550 (United States)
- Vernon Applied Physics, P.O. Box 10469, Torrance, California 90505 (United States)
Recent advances in multilayer mirror technology meet many of the stringent demands of soft-x-ray projection lithography (SXPL). The maximum normal-incidence reflectivity achieved to date is 66% for Mo/Si multilayers at a soft-x-ray wavelength of 13.4 nm, which is sufficient to satisfy the x-ray throughput requirements of SXPL. These high-performance coatings can be deposited on figured optics with layer thickness control of [similar to]0.5%. Uniform multilayer coatings are required for SXPL imaging optics, for which maintaining the surface figure is critical to achieving diffraction-limited performance. In contrast the coatings on the condenser optics will be graded to accommodate a large range of angles of incidence. Graded multilayer coatings can also be used to modify the figure of optical substrates without increasing the surface roughness. This offers a potential method for precise fabrication of aspheric imaging optics.
- OSTI ID:
- 5338911
- Journal Information:
- Applied Optics; (United States), Vol. 32:34; ISSN 0003-6935
- Country of Publication:
- United States
- Language:
- English
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Radiation hardness of Mo/Si multilayers designed for use in a soft x- ray projection lithography system
Radiation hardness of Mo/Si multilayers designed for use in a soft x- ray projection lithography system
Related Subjects
REFLECTIVE COATINGS
FABRICATION
USES
MIRRORS
MOLYBDENUM
REFLECTIVITY
SILICON
SOFT X RADIATION
COATINGS
ELECTROMAGNETIC RADIATION
ELEMENTS
IONIZING RADIATIONS
METALS
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SEMIMETALS
SURFACE PROPERTIES
TRANSITION ELEMENTS
X RADIATION
440600* - Optical Instrumentation- (1990-)