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Radiation hardness of molybdenum silicon multilayers designed for use in a soft-x-ray projection lithography system

Journal Article · · Applied Optics; (United States)
DOI:https://doi.org/10.1364/AO.32.006991· OSTI ID:5236245
;  [1];  [2]; ;  [3]
  1. Lawrence Livermore National Laboratory, L-395, P.O. Box 5508, Livermore, California 94550 permanent address is Brigham Young University, 296 ESC, Provo, Utah 84601 (United States)
  2. Lawrence Livermore National Laboratory, L-395, P.O. Box 5508, Livermore, California 94550 (United States)
  3. Physikalisch-Technische Bundesanstalt, Institut Berlin, Abbestrasse 2-12, W-1000 Berlin 10 (Germany)

A molybdenum silicon multilayer is irradiated with 13.4-nm radiation to investigate changes in multilayer performance under simulated soft-x-ray projection lithography (SXPL) conditions. The wiggler--undulator at the Berlin electron storage ring BESSY is used as a quasi-monochromatic source of calculable spectral radiant intensity and is configured to simulate an incident SXPL x-ray spectrum. The test multilayer receives a radiant exposure of 240 J/mm[sup 2] in an exposure lasting 8.9 h. The corresponding average incident power density is 7.5 mW/mm[sup 2]. The absorbed dose of 7.8 [times] 10[sup 10] J/kg (7.8 [times] 10[sup 12] rad) is equivalent to 1.2 times the dose that would be absorbed by a multilayer coating on the first imaging optic in a hypothetical SXPL system during 1 year of operation. Surface temperature increases do not exceed 2 [degree]C during the exposure. Normal-incidence reflectance measurements at [lambda][sub 0] = 13.4 nm performed before radiation exposure are in agreement with measurements performed after the exposure, indicating that no significant damage had occurred.

DOE Contract Number:
W-7405-ENG-48
OSTI ID:
5236245
Journal Information:
Applied Optics; (United States), Journal Name: Applied Optics; (United States) Vol. 32:34; ISSN 0003-6935; ISSN APOPAI
Country of Publication:
United States
Language:
English