Kinetic studies of the chemical vapor deposition of platinum

Journal Article · · Chemistry of Materials; (USA)

DOI:https://doi.org/10.1021/cm00014a007· OSTI ID:5566472

Nixon, B; Norton, P R; Ou, E C; Puddephatt, R J; Roy, S; Young, P A ^[1]

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1. Univ. of Western Ontario, London (Canada)

The organometallic chemical vapor deposition (CVD) of metallic platinum films has potential applications in microelectronics and in wear protection and has been the subject of several recent studies. Qualitative observations with several precursors have indicated that CVD can be enhanced by the presence of H{sub 2}, by UV irradiation, and by other methods, but no kinetic studies of platinum CVD have been reported. This article describes the use of FTIR and UV spectroscopies to monitor the rate of CVD of platinum with cis-(PtMe{sub 2}(MeNC){sub 2}), 1, as precursor.

• OSTI ID: 5566472
• Journal Information: Chemistry of Materials; (USA), Journal Name: Chemistry of Materials; (USA) Vol. 3:2; ISSN CMATE; ISSN 0897-4756
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
ABSORPTION SPECTROSCOPY
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
DATA
DATA ANALYSIS
DEPOSITION
ELEMENTS
EXPERIMENTAL DATA
INFORMATION
INFRARED SPECTRA
METALS
NUMERICAL DATA
PLATINUM
PLATINUM METALS
SPECTRA
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENTS
ULTRAVIOLET SPECTRA