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Characterization of tungsten, tungsten oxide, and platinum cluster films fabricated by laser-assisted chemical vapor deposition

Thesis/Dissertation ·
OSTI ID:5605712

Optically transparent tungsten, tungsten oxide, and platinum thin films have been fabricated by laser-assisted chemical vapor deposition (LCVD) through multiphoton and/or single photon dissociation of organometallic precursors. The films were characterized by FTIR, Raman and UV-visible spectroscopies, refractive index measurements, transmission electron microscopy (TEM), and electron diffraction to elucidate the gas phase processes which govern deposition. These methods provide evidence to support the assertion that clusters and ultrafine metal particles form in the gas phase by coalescence growth and deposit onto substrates, maintaining their cluster form to create porous, polymorphous films. Post-deposition studies of the films were conducted to compare the different chemistry of these materials, and evaluate them for potential applications. Post-deposition oxidation of the tungsten films led to metal-centered chemistry whereas similar treatment of the platinum films led to the oxidation and volatilization of the organic ligands while leaving the platinum microstructure intact. Post-deposition oxidation of the tungsten films was compared to simultaneous deposition-oxidation, providing the first study of reactive LCVD.

Research Organization:
Syracuse Univ., NY (United States)
OSTI ID:
5605712
Country of Publication:
United States
Language:
English