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Title: Ultralow recombination velocity at Ga sub 0. 5 In sub 0. 5 P/GaAs heterointerfaces

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.101656· OSTI ID:5524325
; ; ; ;  [1]
  1. Solar Energy Research Institute, Golden, Colorado 80401 (US)

Using time-resolved photoluminescence, we have examined the optoelectronic properties of Ga{sub 0.5}In{sub 0.5}P/GaAs/Ga{sub 0.5}In{sub 0.5}P double heterostructures grown by organometallic chemical vapor deposition. For comparison, similar structures using Al{sub 0.4}Ga{sub 0.6}As/GaAs and Al{sub 0.5}In{sub 0.5}P/GaAs lattice-matched heterointerfaces were also examined. For the Ga{sub 0.5}In{sub 0.5}P/GaAs heterostructure, we show that the recombination velocity at a Ga{sub 0.5}In{sub 0.5}P/GaAs interface can be less than 1.5 cm/s. As a result, photoluminescence decay times as long as 14 {mu}s have been observed in undoped GaAs double heterostructures. This photoluminescence decay time varies with temperature as {ital T}{sup 1.59}, characteristic of radiative recombination not limited by surface or bulk nonradiative recombination processes. For the Al{sub 0.4}Ga{sub 0.6}As/GaAs and Al{sub 0.5}In{sub 0.5}P/GaAs heterostructures examined in this study, the upper limits of the interface recombination velocity were 210 and 900 cm/s, respectively.

OSTI ID:
5524325
Journal Information:
Applied Physics Letters; (USA), Vol. 55:12; ISSN 0003-6951
Country of Publication:
United States
Language:
English