Laser induced damage in optical materials under UV excimer laser radiation
Conference
·
OSTI ID:552192
- P.N. Lebedev Physical Institute of Russian Academy of Sciences, Moscow (Russian Federation)
The studies of laser damage resistance of silica glass and fluoride crystals (MgF{sub 2}, CaF{sub 2}, and LiF), performed at the wavelengths of excimer lasers ArF (193nm), KrF (248nm), and XeF (353nm) with the pulse duration {approximately} 80ns have given the following set of data: the dependence of the bulk damage threshold on irradiated spot size, ranging in value from 6 to 1200{mu}m.
- Research Organization:
- International Society for Optical Engineering, Washington, DC (United States)
- OSTI ID:
- 552192
- Report Number(s):
- CONF-9410155--Vol.2428
- Country of Publication:
- United States
- Language:
- English
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