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Junction formation in GaAs shallow-homojunction solar cells by the use of spin-on diffusion sources

Conference · · Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
OSTI ID:5489871
Diffusion from a spin-on source has been used to form the n/sup +/ layer in GaAs shallow-homojunction n/sup +//p/p/sup +/ solar cells. This is the first time diffusion has been employed in the fabrication of such cells. Conversion efficiencies as high as about 14% (AM1) have been obtained for small (0.093 cm/sup 2/) test cells with an anodic antireflection coating. The operating characteristics of these cells show that high-quality shallow n/sup +//p junctions can be prepared in GaAs by spin-on diffusion.
Research Organization:
Lincoln Laboratory, Massachusetts Institute of Technology, Lexington, Massachusetts
OSTI ID:
5489871
Report Number(s):
CONF-820906-
Conference Information:
Journal Name: Conf. Rec. IEEE Photovoltaic Spec. Conf.; (United States)
Country of Publication:
United States
Language:
English