Reactively sputtered TeO/sub x/ thin films for optical recording systems
Journal Article
·
· J. Vac. Sci. Technol., A; (United States)
Tellurium suboxide (TeO/sub x/ ) thin films have been obtained by rf reactive sputtering deposition by using a Te target and an Ar--O/sub 2/ gas mixture. Different samples were prepared by changing both the rf power (80--200 W) and the oxygen concentration in the sputtering gas. The transmissivity and the reflectivity of these films change markedly by thermal treatment at critical temperatures in the range 120--150 /sup 0/C. This property makes these films suitable for optical disk recording with a low-output power laser diode.
- Research Organization:
- Dipartimento di Fisica, Universita di Lecce, Italy, and Centro Interuniversitario di Struttura della Materia, CISM, Italy
- OSTI ID:
- 5484605
- Journal Information:
- J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:2; ISSN JVTAD
- Country of Publication:
- United States
- Language:
- English
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