Influence of {gamma}-radiation doses on the properties of TeO{sub x}: (x=2-3) thin film

Journal Article · Wed Aug 15 04:00:00 EDT 2007 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2769778· OSTI ID:21057516

Dewan, Namrata; Sreenivas, K; Gupta, Vinay ^[1]

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1. Department of Physics and Astrophysics, University of Delhi, Delhi-110007 (India)

The influence of {gamma}-ray doses (10-50 Gy) on the optical and electrical properties of radio-frequency sputtered tellurium dioxide (TeO{sub x}) thin film was studied. The composition of the as-deposited TeO{sub x} films deposited under 25% oxygen and 100% oxygen in the sputtering gas mixture (Ar+O{sub 2}) was x=2 and 3, respectively. TeO{sub 3} films were found to be highly sensitive to the {gamma}-radiation doses and the value of optical band gap decrease from 4.18 to 3.56 eV with increasing radiation dose from 10 to 50 Gy. Current-voltage characteristics of the films showed an increase in the value of conductivity with increasing radiation doses. Monotonic decrease in the values of dielectric constant for the deposited films with increase in radiation dose was observed. The effect of {gamma}-ray doses on the properties of TeO{sub x} film has been correlated with the rearrangement of the bipyramidal structure of amorphous TeO{sub x} thin film.

• OSTI ID: 21057516
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 4 Vol. 102; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMORPHOUS STATE
DIELECTRIC MATERIALS
ELECTRIC CONDUCTIVITY
ELECTRIC POTENTIAL
EV RANGE 01-10
GAMMA RADIATION
OXYGEN
PERMITTIVITY
RADIATION DOSES
RADIOWAVE RADIATION
SPUTTERING
TELLURIUM OXIDES
THIN FILMS