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Infrared quenching of photoconductivity and the study of gap states in hydrogenated amorphous silicon alloys

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.331058· OSTI ID:5458222
Infrared quenching of photoconductivity has been investigated for plasma-deposited a-Si:H alloys. The temperature and spectral dependences of the quenching are consistent with a two-level model of competing recombination centers. The infrared quenching spectrum shows that this effect occurs for photons having energies in the range 0.4 eV
Research Organization:
Department of Energy and Environment, Brookhaven National Laboratory, Upton, New York 11973
DOE Contract Number:
AC02-76CH00016
OSTI ID:
5458222
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 53:4; ISSN JAPIA
Country of Publication:
United States
Language:
English