Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Elevated temperature implantation of Al sup + -ions into nickel

Conference · · TMS (The Metallurgical Society) Paper Selection; (USA)
OSTI ID:5442868
;  [1]
  1. Univ. of Connecticut, Storrs (USA)
The effect of substrate temperature on near surface chemical compositions and microstructures produced by Al{sup +}-ion implantation of nickel was investigated for temperatures from 25 to 500 C. Compositions were determined by Auger, energy dispersive x-ray, and Rutherford back scattering analyses. For 25 C implantation, a monotonic increase in aluminum concentration was observed, reaching {approx equal} 75 at.% Al at a fluence of 3 {times} 10{sup 18} ions/cm{sup 2}. However, the aluminum concentration exhibited maximum with fluence when the implantations were performed at 500 C, reaching {approx equal} 40 at.% Al at 1.2 {times} 10{sup 18} ions/cm{sup 2} and then dropping to {approx equal} 25 at.% Al at 2.4 {times} 10{sup 18} ions/cm{sup 2}. The role of microstructural developments in determining the maximum aluminum concentration for 500 C implantation is described. The phases observed are compared to those obtained in room temperature implantation, as well as specimens similarly implanted and then annealed.
OSTI ID:
5442868
Report Number(s):
CONF-840909--
Conference Information:
Journal Name: TMS (The Metallurgical Society) Paper Selection; (USA) Journal Volume: 56
Country of Publication:
United States
Language:
English