Surface alloying tantalum with aluminum

Conference · · TMS (The Metallurgical Society) Paper Selection; (USA)

OSTI ID:5367861

Squib, M; Potter, D I ^[1]

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1. Univ. of Connecticut, Storrs (USA)

Aluminum ions were implanted into tantalum at 180 KV with fluences ranging from 3 x 10{sup 17} to 3 {times} 10{sup 18} ions/cm{sup 2}. The chemical compositions in the implanted layers - determined using AES, x-ray EDS, and RBS - reached {approx equal} 75 atomic % Al at the higher fluences. The microstructures - determined by transmission electron microscopy - contained only a BCC solid solution of aluminum in tantalum up to a fluence of {approx equal} 1.2 {times} 10{sup 18} ions/cm{sup 2}. A transition to an amorphous phase occurred at higher fluences, being complete at 1.9 {times} 10{sup 18} ions/cm{sup 2}. The implanted specimens were annealed for 30 minutes at temperatures from 400 to 800 C. The mechanism of the amorphous phase formation, as well as the details of its crystallization during annealing, are described.

• OSTI ID: 5367861
• Report Number(s): CONF-840909--
• Conference Information: Journal Name: TMS (The Metallurgical Society) Paper Selection; (USA) Journal Volume: 56
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360102* -- Metals & Alloys-- Structure & Phase Studies
360104 -- Metals & Alloys-- Physical Properties
ALLOYS
ALUMINIUM ADDITIONS
ALUMINIUM ALLOYS
ALUMINIUM IONS
AMORPHOUS STATE
ANNEALING
AUGER ELECTRON SPECTROSCOPY
BACKSCATTERING
BCC LATTICES
CHARGED PARTICLES
CHEMICAL COMPOSITION
CRYSTAL LATTICES
CRYSTAL STRUCTURE
CRYSTALLIZATION
CUBIC LATTICES
DISPERSIONS
ELASTIC SCATTERING
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
HEAT TREATMENTS
ION IMPLANTATION
IONS
MICROSCOPY
MICROSTRUCTURE
MIXTURES
PHASE TRANSFORMATIONS
RUTHERFORD SCATTERING
SCATTERING
SOLID SOLUTIONS
SOLUTIONS
SPECTROSCOPY
SURFACE PROPERTIES
TANTALUM ALLOYS
TANTALUM BASE ALLOYS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY SPECTROSCOPY