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In situ growth of YBa sub 2 Cu sub 3 O sub x thin films by reactive cosputtering

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
DOI:https://doi.org/10.1116/1.578070· OSTI ID:5427736
; ; ; ;  [1]
  1. Department of Applied Physics, Stanford University, Stanford, California 94305 (United States)
We have synthesized superconducting YBa{sub 2}Cu{sub 3}O{sub {ital x}} thin films {ital in} {ital situ} using magnetron cosputtering with three metallic targets (Y, Ba, Cu). We present details of the sputtering chamber, as well as the growth conditions necessary to obtain superconducting films. We discuss the effects of oxygen and ozone partial pressure, differential pumping, O{sub 2}--Ar plasma deposition and Ba--Cu alloy targets. We elaborate on our ozone condensing and delivery system. Finally, we describe the difficulties encountered with the deposition system and provide details of possible improvements.
OSTI ID:
5427736
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 10:1; ISSN 0734-2101; ISSN JVTAD
Country of Publication:
United States
Language:
English