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Surface reconstruction in layer-by-layer sputtering of Si(111)

Journal Article · · Physical Review, B: Condensed Matter; (United States)
;  [1]
  1. Sandia National Laboratories, Albuquerque, New Mexico 87185 (United States)
Using scanning tunneling microscopy, we have investigated vacancy-mediated, layer-by-layer removal of surface atoms from Si(111) under 225-eV Xe-ion bombardment. We observe, with increasing substrate temperature, both the transition from vacancy-cluster nucleation to step retraction, and a transition from disruption to preservation of the 7{times}7 reconstruction on exposed material. We discuss the consequences of these observations for ion-beam-mediated epitaxy.
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5424274
Journal Information:
Physical Review, B: Condensed Matter; (United States), Journal Name: Physical Review, B: Condensed Matter; (United States) Vol. 44:24; ISSN 0163-1829; ISSN PRBMD
Country of Publication:
United States
Language:
English