Optical constants for thin films of C, diamond, Al, Si, and CVD SiC from 24 A to 1216 A

Journal Article · Fri Jan 15 04:00:00 EST 1988 · Appl. Opt.; (United States)

DOI:https://doi.org/10.1364/AO.27.000279· OSTI ID:5373071

Windt, D L; Cash, Jr, W C; Scott, M; Arendt, P; Newnam, B; Fisher, R F; Swartzlander, A B; Takacs, P Z; Pinneo, J M

A method for deriving optical constants from reflectance vs angle of incidence measurements using a nonlinear least-squares curve-fitting technique based on the chi/sup 2/-test of fit is presented and used to derive optical constants for several thin-film materials. The curve-fitting technique incorporates independently measured values for the film surface roughness, film thickness, and incident beam polarization. The technique also provides a direct method for estimating probable errors in the derived optica constants. Data are presented from 24 A to 1216 A for thin-film samples of C, synthetic diamond, Al, Si, and CVD SiC. AUger electron spectroscopy depth profiling measurements were performed on some of the samples to characterize sample composition including oxidation and contamination.

• Research Organization: University of Colorado, Center for Astrophysics and Space Astronomy, Boulder, Colorado 80309
• OSTI ID: 5373071
• Journal Information: Appl. Opt.; (United States), Journal Name: Appl. Opt.; (United States) Vol. 27:2; ISSN APOPA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360104 -- Metals & Alloys-- Physical Properties
360603* -- Materials-- Properties
ALUMINIUM
CARBIDES
CARBON
CARBON COMPOUNDS
DATA
DIAMONDS
ELECTROMAGNETIC RADIATION
ELEMENTAL MINERALS
ELEMENTS
EXPERIMENTAL DATA
FILMS
GRAPHITE
INCIDENCE ANGLE
INFORMATION
IONIZING RADIATIONS
LEAST SQUARE FIT
MAXIMUM-LIKELIHOOD FIT
METALS
MINERALS
NONMETALS
NUMERICAL DATA
NUMERICAL SOLUTION
OPTICAL PROPERTIES
PHYSICAL PROPERTIES
RADIATIONS
SEMIMETALS
SILICON
SILICON CARBIDES
SILICON COMPOUNDS
SPECTRAL REFLECTANCE
THIN FILMS
ULTRAVIOLET RADIATION
X RADIATION