Characterization of AZ PN114 resist for soft-x-ray projection lithography

Journal Article · Wed Dec 01 04:00:00 EST 1993 · Applied Optics; (United States)

DOI:https://doi.org/10.1364/AO.32.007044· OSTI ID:5335265

Early, K; Tennant, D M; Jeon, D Y; Mulgrew, P P; MacDowell, A A; Wood, II, O R ^[1]; Kubiak, G D; Tichenor, D A ^[2]

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1. AT T Bell Laboratories, Crawford Corner Road, Holmdel, New Jersey 07733-1988 (United States)
2. Division 8342, Sandia National Laboratories, Livermore, California 94551-0969 (United States)

Using 14-nm wavelength illumination, we have imaged 0.1-[mu]m-wide lines and spaces in single-layer thin films of the highy sensitive, negative, chemically amplified resist AZ PN114 by using both a Schwarzschild 20[times] camera and an Offner ring field 1[times] optical system. For soft-x-ray projection lithography the approximate 0.2-[mu]m absorption length in resists at 14-nm wavelength necessitates a multilayer resist system. To explore further the requirements of the imaging layer of such a system, we have transferred patterns, exposed by a high-resolution electron beam in a 60-nm-thick layer of AZ PN114, into the underlying layers of a trilevel structure. Significant pattern edge noise and resist granularity were found. It remains to be determined whether the observed noise is dominated by statistical fluctuations in dose or by resist chemistry. We also investigated pinhole densities in these films and found them to increase from 0.2 cm[sup [minus]2] for 380-mm-thick films to 15 cm[sup [minus]2] for 50-nm-thick films.

• OSTI ID: 5335265
• Journal Information: Applied Optics; (United States), Journal Name: Applied Optics; (United States) Vol. 32:34; ISSN 0003-6935; ISSN APOPAI
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426000* -- Engineering-- Components
Electron Devices & Circuits-- (1990-)
ELECTROMAGNETIC RADIATION
ELECTRONIC CIRCUITS
FABRICATION
FILMS
IMAGES
INTEGRATED CIRCUITS
IONIZING RADIATIONS
MICROELECTRONIC CIRCUITS
RADIATIONS
RESOLUTION
ROUGHNESS
SOFT X RADIATION
SPATIAL RESOLUTION
SURFACE PROPERTIES
THIN FILMS
X RADIATION