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Title: Optically induced nitrogen dangling-bonds in amorphous hydrogenated silicon nitride thin films

Conference ·
OSTI ID:5329608
;  [1];  [2];  [3]
  1. Sandia National Labs., Albuquerque, NM (United States)
  2. IBM Watson Research Center, Yorktown Heights, NY (United States)
  3. Army Electronics Technology and Devices Lab., Fort Monmouth, NJ (United States)

Using X-band and Q-band electron paramagnetic resonance (EPR) microwave frequencies we have confirmed a model for the ultra-violet (UV) induced nitrogen dangling-bond in N-rich amorphous hydrogenated silicon nitride thin films. We also report for the first time that the UV-induced N dangling-bonds can be photo-bleached (light induced annealing) by sub-bandgap light. Since the photo-bleaching phenomenon is reversible, i.e., these defect centers can be reversibly photo-created or photo-bleached -- a process requiring short vs. long-wave UV -- without any change in the net space charge density of the films, it is suggested that an optical rearrangement of spin state and charge state of positive, negative, and neutral nitrogen sites occurs. This study has also shown that the N dangling-bond is an electrically active point defect in these thin films.

Research Organization:
Sandia National Labs., Albuquerque, NM (United States)
Sponsoring Organization:
USDOE; USDOE, Washington, DC (United States)
DOE Contract Number:
AC04-76DP00789
OSTI ID:
5329608
Report Number(s):
SAND-91-2371C; CONF-9105342-1; ON: DE92013660
Resource Relation:
Conference: Electro Chemical Society (ECS) meeting, St. Louis, MO (United States), 17-22 May 1991
Country of Publication:
United States
Language:
English