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U.S. Department of Energy
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Photovoltaic mechanisms in polycrystalline thin-film solar cells. Final report, 28 September 1978-28 September 1979

Technical Report ·
OSTI ID:5266549
Studies were undertaken to examine grain boundaries in polycrystalline material and apply these results to the development of thin-film solar cells using InP as the absorber layers. A model was developed which related material parameters to leakage currents in a thin-film polycrystalline p-n junction. In this model, the grain boundary was treated as a semiconductor with bandgap lower than that of the surrounding bulk. Since a leakage current at the grain boundary might decrease for a wider bandgap material, InGaP was considered and deposited by planar reactive deposition (PRD) on a single-crystal InP and lattice-matched GaAs. X-ray analysis and Hall measurements indicated that the quality of the epitaxy on GaAs was superior to that on InP, presumably due to a closer lattice match. Parallel etching studies to preferentially remove the grain boundaries showed that a 5HCl: 3HNO/sub 3/ : 4HF etch was highly selective in attacking the grain boundaries in bulk polycrystalline InP. Canyons with depths greater than 10 ..mu..m and widths on the order of 1 ..mu..m are the most common form of attack.
Research Organization:
Hughes Research Labs., Malibu, CA (USA)
DOE Contract Number:
AC01-78ET20544
OSTI ID:
5266549
Report Number(s):
DOE/ET/20544-T1; ON: DE84009522
Country of Publication:
United States
Language:
English