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U.S. Department of Energy
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Photovoltaic mechanisms in polycrystalline thin-film solar cells. Quarterly technical progress report No. 3, April 27-July 27, 1979

Technical Report ·
DOI:https://doi.org/10.2172/5430380· OSTI ID:5430380
Indium phosphide films were prepared on (100) InP substrates by the planar reactive deposition technique in the temperature range 220 to 260/sup 0/C and growth rates of about 1 ..mu..m/hr, complete single-crystal epitaxy was achieved. The onset of the single-crystal to polycrystalline transition at 245/sup 0/C is characterized by a mosaic structure. Parallel studies to eventually passivate the grain boundaries in polycrystalline films were undertaken. A 5HC1:3HNO/sub 3/:4HF etch was found to preferentially attack 90% of the grain boundaries in bulk polycrystalline InP wafers. Canyons with depths greater than 10 ..mu..m and widths less than 1 ..mu..m were the most common form of attack. Although the etch had no effect on simple twin boundaries, preferential attack was observed at interfaces formed by multiple twinning events.
Research Organization:
Hughes Research Labs., Malibu, CA (USA)
OSTI ID:
5430380
Report Number(s):
DSE-3412-T3
Country of Publication:
United States
Language:
English