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Investigation of In/sub x/Ga/sub 1/. sqrt. /sub x/AsGaAs quantum wells grown by molecular-beam epitaxy

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.340369· OSTI ID:5253743

Photoluminescence (PL) and transmission electron microscopy have been used to study strained In/sub x/Ga/sub 1/..sqrt../sub x/AsGaAs (x = 0.24--0.28) quantum wells (QWs) grown by molecular-beam epitaxy. The three QWs grown without growth interruptions produce high intensity PL peaks of narrow full width at half-maximum (2.9 meV). On the other hand, the PL peaks in the QWs grown with 30-s interruptions are relatively broad, less symmetric, and show lower PL intensities, compared with the noninterrupted QWs. Our results show that high-quality strained In/sub x/Ga/sub 1/..sqrt../sub x/AsGaAs QWs can be grown without growth interruptions

Research Organization:
Department of Electrical and Computer Engineering, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213
OSTI ID:
5253743
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 63:11; ISSN JAPIA
Country of Publication:
United States
Language:
English