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Modification of Y sub 2 Ba sub 4 Cu sub 8 O sub 16 thin-film surfaces by interaction with a radio frequency excited oxygen plasma

Journal Article · · Applied Physics Letters; (USA)
DOI:https://doi.org/10.1063/1.102365· OSTI ID:5246839
;  [1]
  1. Department of Applied Science, Brookhaven National Laboratory, Upton, New York 11973 (USA)
The use of rf excited oxygen plasma for oxidizing and possible etching of SrTiO{sub 3} (100) supported Y{sub 2}Ba{sub 4}Cu{sub 8}O{sub 16} thin films is studied by photoemission. Oxygen plasma modifies the surface and eliminates photoemission features identified with surface impurities like BaCO{sub 3}. The resulting surface is barium deficient but shows a Fermi level suggesting it is metallic. Application of a {minus}200 V dc bias to the sample to increase the kinetic energy of the incident oxygen ions enhances either surface sputtering or atomic mixing and produces a surface which resembles YBa{sub 2}Cu{sub 3}O{sub 7}, because the photoemission spectra are similar to those published for cleaved crystal surfaces or films.
DOE Contract Number:
AS05-80ER10742; AC02-76CH00016
OSTI ID:
5246839
Journal Information:
Applied Physics Letters; (USA), Journal Name: Applied Physics Letters; (USA) Vol. 55:22; ISSN APPLA; ISSN 0003-6951
Country of Publication:
United States
Language:
English